Solvents for photoresist removal
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United States of America Patent
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Aug 23, 1988
Grant Date -
N/A
app pub date -
Oct 20, 1986
filing date -
Oct 22, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
The invention relates to solvent systems which are based on water-soluble amino derivatives and propylene glycol components, for removing photoresists. These solvent systems are comprised of (a) from about 10 to 100% by weight of at least one water-soluble amine of the general formula ##STR1## in which R.sup.1, R.sup.2, R.sup.3, R.sup.4 denote H or alkyl groups n,m denote 0 to 2, and o denotes 1 to 3; and (b) from about 0 to 90% by weight of at least one water-soluble propylene glycol derivative of the general formula ##STR2## in which R.sup.3, R.sup.4 denote H, alkyl or ##STR3## and P denotes 1 to 3.
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