Plasma product treatment apparatus and methods and gas transport systems for use therein
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United States of America Patent
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Oct 11, 1988
Grant Date -
N/A
app pub date -
Jan 20, 1987
filing date -
Jan 20, 1987
priority date (Note) -
Expired
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Abstract
In semiconductor treatment apparatus with a plasma generating zone, a treatment zone, and a bent path connecting the two so as to block direct transmission of ultraviolet light from the plasma generating zone to the workpiece in the treatment zone, a light trap is provided to suppress indirect transmission of light as by reflection or by transmission within transparent walls of a conduit defining the bent path.
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