Method of aligning a mask and a substrate relative to each other and arrangement for carrying out the method
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United States of America Patent
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-
Oct 18, 1988
Grant Date -
N/A
app pub date -
Sep 24, 1986
filing date -
Mar 12, 1986
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and an arrangement for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks wherein by using two separate alignment systems (AS.sub.1, AS.sub.2) which are each associated with one mask mark (M.sub.1, M.sub.2) and which are each used for aligning the substrate marks (P.sub.1, P.sub.2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus and in addition it is possible to detect magnification errors.
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