Method for production of thin film transistor array substrates

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4778560
SERIAL NO

07056989

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of production of active matrix display substrates using thin film transistors and more particularly to a method for production of substrates for liquid-crystal display use. The active matrix substrate using the thin film transistor is produced by the mask processes of smaller number. The process of the present invention can reduce the number of the masks, by one, of the active matrix substrate using the inverted staggered thin film transistor which requires the masks from five levels to six levels. Further improvements reduce the number of the masks to four levels from three levels, thus contributing greatly towards lower cost, improved yield.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.OSAKA11438

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kawaguchi, Takao Hirakata, JP 5 142
Nagata, Seiichi Sakai, JP 24 529
Nanno, Yutaka Neyagawa, JP 15 433
Okawa, Noriko Osaka, JP 1 76
Takeda, Etsuya Suita, JP 11 346

Cited Art Landscape

Patent Info (Count) # Cites Year
 
SHARP KABUSHIKI KAISHA (1)
* 4514253 Manufacture of thin film transistor 32 1983
 
HOSIDEN AND PHILIPS DISPLAY CORPORATION (1)
* 4654117 Method of fabricating a thin film transistor array 37 1986
 
Seiko Instruments & Electronics Ltd. (1)
* 4624737 Process for producing thin-film transistor 106 1985
* Cited By Examiner

Patent Citation Ranking

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Patent Info (Count) # Cites Year
 
GENERAL ELECTRIC COMPANY (2)
* 5132745 Thin film transistor having an improved gate structure and gate coverage by the gate dielectric 27 1991
* 5362660 Method of making a thin film transistor structure with improved source/drain contacts 74 1992
 
Other [Check patent profile for assignment information] (5)
* 2002/0080,295 TFT active matrix liquid crystal display devices 0 2002
* 2005/0068,485 TFT active matrix liquid crystal display devices 0 2004
* 2006/0028,605 TFT active matrix liquid crystal display devices 0 2005
* 2006/0268,212 TFT active marix liquid crystal display devices 3 2006
* 2009/0174,829 LIQUID CRYSTAL DISPLAY APPARATUS 3 2009
 
SHARP KABUSHIKI KAISHA (10)
* 4918494 Thin film transistor 6 1989
* 5054887 Active matrix type liquid crystal display 97 1989
* 5159477 Active matrix display device having additional capacitors connected to switching elements and additional capacitor common line 42 1990
* 5231039 Method of fabricating a liquid crystal display device 66 1991
* 5212574 Active matrix board having double-layer scan lines and capacity lines with discontinuous lower scan lines and lower capacity lines 36 1992
* 5728592 Method for fabricating a thin film transistor matrix device 18 1995
* 5879973 Method for fabricating thin-film transistor 16 1995
* 5953583 Manufacturing method of a thin-film transistor 10 1997
* 5994173 Thin film transistor matrix device and method for fabricating the same 9 1997
6338990 Method for fabricating thin-film transistor 15 1998
 
SEIKO EPSON CORPORATION (1)
* 5175114 Method for production of a bidirectional nonlinear resistor, active matrix liquid crystal panel using bidirectional nonlinear resistor 4 1990
 
GETNER FOUNDATION LLC (3)
* 6514804 Thin-film transistor and fabrication method thereof 10 2000
* 6890783 Active matrix substrate plate and manufacturing method therefor 13 2002
* 2003/0013,221 Active matrix substrate plate and manufacturing method therefor 4 2002
 
France Telecom - Centre National d'Etudes des Telecommunications (1)
* 5238861 Method for manufacturing an active matrix display screen with storage capacitors 43 1991
 
U.S. PHILIPS CORPORATION (1)
* 5236573 MIM devices, their method of fabrication and display devices incorporating such devices 15 1990
 
SEIKO INSTRUMENTS INC. (1)
* 5637187 Light valve device making 94 1995
 
SAMSUNG DISPLAY CO., LTD. (5)
* 5478766 Process for formation of thin film transistor liquid crystal display 119 1995
* 6008065 Method for manufacturing a liquid crystal display 119 1996
6331443 Method for manufacturing a liquid crystal display 14 1999
6661026 Thin film transistor substrate 5 2002
* RE41363 Thin film transistor substrate 3 2005
 
PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD. (3)
* 5610738 Method for making LCD device in which gate insulator of TFT is formed after the pixel electrode but before the video signal line 28 1995
* 5532850 TFT active matrix liquid crystal display with gate lines having two layers, the gate electrode connected to the wider layer only 39 1995
* 5671027 LCD device with TFTs in which pixel electrodes are formed in the same plane as the gate electrodes with anodized oxide films and before the deposition of the silicon gate insulator 30 1995
 
AU OPTRONICS CORP. (3)
* 7098091 Method for fabricating thin film transistors 1 2004
* 2005/0186,719 Method for fabricating thin film transistors 0 2004
* 8110452 Liquid crystal display device and manufacturing method thereof 0 2007
 
HITACHI, LTD. (13)
* 4955697 Liquid crystal display device and method of driving the same 72 1988
* 5032536 Method for manufacturing a liquid crystal display device with thin-film-transistors 30 1989
* 5032531 Method of manufacturing active matrix panel 77 1989
* 5331447 TFT active matrix liquid crystal display devices with plural TFTs in parallel per pixel 40 1992
* 5528396 TFT active matrix liquid crystal display devices with a holding capacitance between the pixel electrode and a scanning signal line 34 1994
* 5708484 TFT active matrix liquid crystal display devices with two layer gate lines, the first being the same level and material as gate electrodes 33 1996
* 5838399 TFT active matrix liquid crystal display devices with two layer gate lines, the first being the same level as gate electrodes. 22 1997
* 6184963 TFT active matrix LCD devices employing two superposed conductive films having different dimensions for the scanning signal lines 6 1998
6384879 Liquid crystal display device including thin film transistors having gate electrodes completely covering the semiconductor 9 2000
6839098 TFT active matrix liquid crystal display devices 10 2002
6992744 TFT active matrix liquid crystal display devices 8 2004
7196762 TFT active matrix liquid crystal display devices 8 2005
7450210 TFT active matrix liquid crystal display devices 4 2006
 
FUJI XEROX CO., LTD. (3)
* 5366912 Fabrication method of thin-film transistor 30 1989
* 5075244 Method of manufacturing image sensors 33 1990
* 5320973 Method of fabricating a thin-film transistor and wiring matrix device 27 1993
 
NEC CORPORATION (1)
* 5182661 Thin film field effect transistor array for use in active matrix liquid crystal display 89 1991
 
North American Philips Corporation (3)
* 5305128 Active matrix electro-optic display device with storage capacitors and projection color apparatus employing same 18 1993
* 5929463 Active matrix electro-optic display device with storage capacitors and projection color apparatus employing same 6 1994
* 6235546 Method of forming an active matrix electro-optic display device with storage capacitors 1 1994
 
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (6)
7416907 Semiconductor device and method for forming the same 4 2004
* 7329906 Semiconductor device and method for forming the same 4 2004
7423290 Electro-optical device and driving method for the same 6 2006
* 2006/0151,792 Electro-optical device and driving method for the same 0 2006
8026886 Electro-optical device and driving method for the same 0 2008
8106867 Electro-optical device and driving method for the same 0 2008
 
MITSUBISHI ELECTRIC CORPORATION (3)
* 7084017 Liquid crystal display 10 2004
* 2005/0082,527 Liquid crystal display 1 2004
* 7755088 Liquid crystal display 8 2008
 
TOPPOLY OPTOELECTRONICS CORP. (2)
* 5075237 Process of making a high photosensitive depletion-gate thin film transistor 31 1990
* 5196911 High photosensitive depletion-gate thin film transistor 9 1991
 
LG DISPLAY CO., LTD. (17)
* 6559920 Liquid crystal display device and method of manufacturing the same 8 2000
* 6818923 Thin film transistor array substrate and manufacturing method thereof 19 2002
* 2003/0197,187 Thin film transistor array substrate and manufacturing method thereof 4 2002
6862051 Liquid crystal display device and method of manufacturing the same 4 2003
* 7022557 Thin film transistor array substrate and manufacturing method thereof 4 2004
* 7468527 Liquid crystal display device and fabricating method thereof 5 2005
* 2005/0263,768 Liquid crystal display device and fabricating method thereof 4 2005
* 7760309 Transflective liquid crystal display device and fabricating method thereof 4 2005
* 8018545 Method of fabricating a liquid crystal display device 0 2005
* 7932979 Method for fabricating a liquid crystal display device wherein the storage electrode is simultaneously formed with the active pattern 1 2005
* 2006/0044,485 Liquid crystal display device and fabrication method thereof 3 2005
* 7649582 Array substrate for a liquid crystal display device having multi-layered metal line and fabricating method thereof 5 2007
* 2007/0273,805 Array substrate for a liquid crystal display device having multi-layered metal line and fabricating method thereof 2 2007
8017462 Method of making a liquid crystal display device capable of increasing capacitance of storage capacitor 1 2008
* 2009/0085,040 Liquid crystal display device and fabricating method thereof 3 2008
7995154 Array substrate for a liquid crystal display device having multi-layered metal line and fabricating method thereof 0 2009
8072565 Transflective liquid crystal display device 1 2010
 
SEIKO PRECISION INC. (4)
* 5034340 Amorphous silicon thin film transistor array substrate and method for producing the same 23 1989
* 5065202 Amorphous silicon thin film transistor array substrate and method for producing the same 8 1990
* 5121177 Silicon thin film transistor 3 1990
* 5121178 Silicon thin film transistor 2 1990
 
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (1)
* 5270229 Thin film semiconductor device and process for producing thereof 37 1992
 
Canon Kabushiki Kaisha (2)
* 6208400 Electrode plate having metal electrodes of aluminum or nickel and copper or silver disposed thereon 9 1997
6184964 Electrode plate with two-layer metal electrodes including copper or silver layer, and flattened anti-oxidation and insulating layers 5 1999
* Cited By Examiner