Photolithographic mask repair system
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United States of America Patent
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-
Oct 18, 1988
Grant Date -
N/A
app pub date -
Oct 17, 1986
filing date -
Oct 17, 1986
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method and device are provided to accomplish laser driven pyrolytic, photolytic and photoactivativation process requiring controlled atmosphere without the use of gas tight cells. A method and device are provided to correct clear faults on a photo-lithographic mask by metallic deposition on the mask at standard temperature and pressure. The deposition is formed by the pyrolytic decomposition of an organometallic gas mixture which may include chromium and molybdenum hexacarbonyls, and a buffer gas. The decomposition is done utilizing a laser beam. The device may be incorporated into a system which has other members used to correct opaque faults in the same mask.
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