Agent and method for the removal of photoresist and stripper residues from semiconductor substrates

United States of America Patent

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Nov 22, 1988
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N/A
app pub date
Jul 20, 1987
filing date
Jan 19, 1985

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Expired

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Abstract

Photoresist and stripper residues can be rapidly and completely removed from semiconductor substrates after the stripping process with an aqueous post-rinsing agent which contains a nonionogenic surfactant and an organic base.

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Patent Owner(s)

Patent Owner	Address
MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG	FRANKFURTER STRASSE 250 DARMSTADT 64293

International Classification(s)

G03C:PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Litters, Alois	Lampertheim Hofheim, DE	1	50
Neisius, Karl H	Darmstadt, DE	3	82

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Agent and method for the removal of photoresist and stripper residues from semiconductor substrates

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07077970

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PATENT NO	4786578
SERIAL NO	07077970
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07077970

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