Process for washing semiconductor substrate with organic solvent
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United States of America Patent
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Nov 29, 1988
Grant Date -
N/A
app pub date -
Apr 17, 1986
filing date -
Apr 17, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Disclosed is a process for washing a semiconductor substrate with an organic solvent, which comprises the first stage of supplying an organic solvent to be used for the organic solvent washing of a semiconductor substrate to a washing device and washing the semiconductor substrate, the second stage of supplying the organic solvent containing water, electrolytes and particulate or clustery suspended substances, which has been withdrawn from the first stage, to a pervaporation device and separating and removing mainly water, and the third stage of supplying the organic solvent withdrawn from the second stage to a distillation device to obtain the organic solvent as a distillate and recycling the distillate as the organic solvent to the first stage, the three stages being combined to form a continuous circulation systems.
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