Polyarylene polyether made using mixed base system

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United States of America Patent

PATENT NO 4789722
SERIAL NO

07080144

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Abstract

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Polyarylene polyethers, made by a process comprising reacting a dihydroxy compound and strong and weak bases in a liquid reaction medium at 100.degree.-200.degree. C. to form a double salt and then reacting the double salt with a slight molar excess of dihalobenzenoid compound bearing two replaceable halogens, are disclosed. The process reliably produces halogen-terminated polyarylene polyethers of select degrees of polymerization and desirable correspondence between weight and number average molecular weights. In subsequent steps amine-terminated polyarylene polyethers are made using the strong and weak bases. The resulting amine-terminated polyethers have a low, select degree of polymerization, desirable correspondence between weight and number average molecular weights and high level of amine termination.

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Patent Owner(s)

  • HEXCEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jabloner, Harold New Castle, DE 15 162
Nguyen, Tuyen T Wilmington, DE 30 229

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