Integrated metrology for microlithographic objective reducing lens
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United States of America Patent
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Dec 13, 1988
Grant Date -
N/A
app pub date -
Dec 1, 1986
filing date -
Dec 1, 1986
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Metrology for a microlithographic objective reducing lens 10 is integrated into a metrology block 20 secured to a lower region of the barrel 15 for lens 10. Block 20 has a central opening 27 around a lowermost element 11 of lens 10; and block 20 mounts distance detectors 28 around central opening 27, a pair of microscope objectives 30 and 31, and a pair of X and Y mirrors 40 and 41.
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