Laser pattern generation apparatus
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United States of America Patent
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Jan 3, 1989
Issued Date -
N/A
app pub date -
Mar 28, 1988
filing date -
Jul 24, 1985
priority date (Note) -
Expired
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Abstract
A laser pattern generation apparatus particularly suited for semiconductor applications. The laser beam is split into a plurality of beams and modulated with acousto-optic modulators. A rotating mirror having a plurality of facets causes the beam to scan the workpiece.
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