Process for forming deposited film
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United States of America Patent
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-
Jan 31, 1989
Grant Date -
N/A
app pub date -
Feb 21, 1986
filing date -
Feb 25, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A process for forming a deposited film comprises introducing into a film forming space housing a substrate therein an active species (A) formed by decomposition of a compound containing germanium and a halogen and an active species (B) formed from a chemical substance for film formation which is reactive with said active species (A) separately from each other, then providing them with discharge energy and thereby allowing both the species to react with each other thereby to form a deposited film on the substrate.
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