Process for preparing a functional deposited film

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United States of America Patent

PATENT NO 4803093
SERIAL NO

06843236

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Abstract

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Process for preparing a functional film deposited on a substrate having practically applicable characteristics which is usable as a photoconductive member in semiconductor device, image input line sensor, image pickup device on the like by generating an active species by subjecting a gaseous substance capable of being activated to generate said active species to the action of activating energy in an active species generating and transporting space leading to a film forming space containing the substrate; simultaneously generating a precursor by subjecting a gaseous substance capable of generating said precursor to the action of activating energy in a precursor generating and transporting space located separately from and within the active species generating and transporting space and open in a downstream region of that space; and introducing the resulting active species and precursor into the film forming space to chemically react to form the functional deposited film on the substrate in the absence of plasma.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHA 30-2 3-CHOME SHIMOMARUKO OHTA-KU TOKYO JAPAN A CORP OF JAPANNot Provided

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishihara, Shunichi Ebina, JP 75 1432
Oda, Shunri Tokyo, JP 23 500
Saito, Keishi Nabari, JP 63 12508
Shimizu, Isamu Yokohama, JP 92 2031

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