Contact lithographic fabrication of patterns on large optics
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United States of America Patent
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-
Mar 7, 1989
Issued Date -
N/A
app pub date -
Mar 27, 1987
filing date -
Nov 18, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An apparatus and method for the generation of patterns on large optics. A coating layer is deposited on the surface of a large substrate, whereupon a photoresist layer is deposited on the coating layer in relatively small localized areas. A flexible mask is fabricated embodying the pattern to be generated. This flexible mask is then aligned with any desired point on the substrate and brought into contact with the photoresist layer. The photoresist layer is then exposed and each localized area is developed and the underlying coating layer is etched. After the excess photoresist material is washed away the pattern, etched into the coating layer, remains.
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