Thin film deposition apparatus and method
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United States of America Patent
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Apr 4, 1989
Issued Date -
N/A
app pub date -
May 6, 1987
filing date -
Sep 24, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Apparatus and method for the deposition of a thin metal film on a surface of a workpiece as the workpiece is positioned adjacent to a deposition source and as the workpiece and deposition source rotate relative to each other about a first axis. The workpiece can also be moved relative to the deposition source about a second axis as the workpiece and the deposition source rotate relative to each other about the first axis. The distance between the workpiece and the deposition source can be adjusted.
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