Resist developing apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 9, 1989
Grant Date -
N/A
app pub date -
Nov 21, 1986
filing date -
Nov 28, 1985
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A resist developing apparatus comprising a developing tank consisting of a top portion, a body portion, and a bottom portion, at least one of the top, body, and bottom portions being comprised of an inner wall and an outer wall, a heat exchange chamber being defined between the inner and outer walls for being supplied with a heating medium; a chuck disposed inside the developing tank for holding a work piece in position, a nozzle for spraying chemical liquid toward the work piece held in position by the chuck; a heating medium supply unit for supplying heating medium at a specified temperature to the heat exchange chamber; and piping connecting between the heating medium supply unit and the heat exchange chamber, whereby the interior of the developing tank is adapted to be controlled to a specified temperature.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully