Hollow cathode plasma assisted apparatus and method of diamond synthesis
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United States of America Patent
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May 16, 1989
Grant Date -
N/A
app pub date -
Jul 2, 1987
filing date -
Jul 2, 1987
priority date (Note) -
Expired
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Abstract
The present invention includes an apparatus and method for depositing diamond on a substrate. A hydrocarbon/hydrogen gas mixture is passed through a refractory metal hollow cathode which is self heated to a high temperature. The gas mixture is dissociated by a combination of thermal and plasma effects. The plasma plume emanating from the hollow cathode heats the substrate which is positioned on a surface of the anode. Growth of the diamond film is enhanced by bombardment of electrons.
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