Process for forming deposition film

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United States of America Patent

PATENT NO 4835005
SERIAL NO

07161386

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Abstract

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A process for forming a deposition film on a substrate comprises introducing separately a precursor or activated species formed in a decomposition space (B) and activated species formed in a decomposition space (C), into the deposition space wherein the film is formed on the substrate.

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHI3-30-2 SHIMOMARUKO OHTA-KU TOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirooka, Masaaki Toride, JP 36 719
Ishihara, Shunichi Ebina, JP 75 1432
Ogawa, Kyosuke Tokyo, JP 66 707
Shimizu, Isamu Yokohama, JP 92 2031

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