Binary chlorofluorocarbon chemistry for plasma etching

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Jun 6, 1989
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Nov 23, 1987
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Nov 23, 1987

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Expired

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Abstract

A plasma comprised of trifluorochloromethane and an oxidant etches non-insulating materials such as tungsten at very high etch rates when the oxidant comprises at least 50% of the plasma by volume.

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INTERNATIONAL BUSINESS MACHINES CORPORATION

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C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....

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Inventor Name	Address	# of filed Patents	Total Citations
Daubenspeck, Timothy H	Colchester, VT	147	1759

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Binary chlorofluorocarbon chemistry for plasma etching

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United States of America Patent

07123639

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07123639

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