Apparatus for processing substrate surface
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United States of America Patent
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-
Jun 13, 1989
Grant Date -
N/A
app pub date -
Sep 18, 1987
filing date -
Sep 19, 1986
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An improved processing apparatus for a substrate surface, which provides uniform and smooth air flows A within the processing chamber 26, by which an even thin film of a processing solution can be formed on the substrate surface. Undersirable surplus processing solution is collected primarily in a first chamber 13. A second chamber 15 is provided which is separate from the first chamber and pneumatically communicated therewith through a slit 16.
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Cited Art Landscape
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