Method for deposition of hard carbon film

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United States of America Patent

PATENT NO 4844785
SERIAL NO

07051798

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Abstract

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A diamond-like hard carbon film is formed on a substrate by impinging particles of carbon onto a surface of the substrate, bombarding the surface of the substrate with accelerated particles of inert gas or particles of carbon together with hydrogen in a direction not more than 10 degrees out of parallel to the surface so that the particles of carbon aggregate on the surface, at room temperature.

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Patent Owner(s)

Patent OwnerAddress
MATSUSHITA ELECTRIC INDUSTRIAL CO LTDOSAKA JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kitabatake, Makoto Katano, JP 80 2488
Wasa, Kiyotaka Nara, JP 32 423

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