US Patent No: 4,851,882

Number of patents in Portfolio can not be more than 2000

Illumination optical system

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Abstract

An illumination optical system including an optical system effective to direct light from a light source to a surface to be illuminated, and an optical unit disposed in a path of the light defined by the optical system, the optical unit having a variable refracting power which is variable in accordance with the size of the surface to be illuminated.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
CANON KABUSHIKI KAISHATOKYO49710

International Classification(s)

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  • [Patents Count]

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suzuki, Akiyoshi Tokyo, JP 109 2138
Takahashi, Kazuhiro Tokorozawa, JP 228 1297

Cited Art

Patent Info (Count) # Cites Year
 
CANON KABUSHIKI KAISHA (2)
4,564,267 Variable-focal-length lens 94 1982
4,645,924 Observation apparatus with selective light diffusion 34 1983
 
NIKON CORPORATION (2)
4,497,015 Light illumination device 138 1983
4,619,508 Illumination optical arrangement 142 1985
 
POLAROID CORPORATION (1)
4,444,471 Variable focus lens system employing elastomeric lens 53 1982

Patent Citation Ranking

Forward Cites

Patent Info (Count) # Cites Year
 
NIKON CORPORATION (19)
5,245,384 Illuminating optical apparatus and exposure apparatus having the same 82 1992
5,296,892 Illuminating apparatus and projection exposure apparatus provided with such an illuminating apparatus 30 1993
7,656,504 Projection exposure apparatus with luminous flux distribution 0 1995
6,252,647 Projection exposure apparatus 30 1995
5,745,294 Illuminating optical apparatus 18 1996
5,760,963 Fly-eye lens, illumination optical apparatus, and exposure apparatus 13 1996
RE37352 Projection optical apparatus 0 1996
6,388,733 Exposure apparatus with an anti-vibration structure 14 1999
6,636,293 Exposure method and apparatus having a decreased light intensity distribution 5 1999
6,710,854 Projection exposure apparatus 16 2001
6,704,092 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane 10 2002
6,864,959 Projection exposure apparatus 2 2002
6,665,050 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis 6 2002
6,710,855 Projection exposure apparatus and method 22 2002
6,985,288 Illumination apparatus for microscope and microscope 4 2003
6,967,710 Projection exposure apparatus and method 2 2004
6,897,942 Projection exposure apparatus and method 4 2004
6,885,433 Projection exposure apparatus and method 4 2004
7,095,560 Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method 11 2004
 
CANON KABUSHIKI KAISHA (14)
4,988,188 Illumination device 94 1988
5,121,160 Exposure method and apparatus 59 1991
5,424,803 Projection exposure apparatus and semiconductor device manufacturing method 15 1994
5,436,692 Projection exposure apparatus and semiconductor device manufacturing method 26 1994
5,828,496 Illumination optical system 5 1994
5,847,746 Projection exposure apparatus including a condenser optical system for imaging a secondary light source at positions different in an optical axis direction with respect to two crossing planes 8 1995
5,719,617 Illumination system for superposing light beams one upon another on a surface using a projecting system having different focal point positions 12 1995
6,271,909 Exposure apparatus and device manufacturing method including changing a photo-intensity distribution of a light source and adjusting an illuminance distribution on a substrate in accordance with the change 7 1995
5,946,024 Illuminating apparatus and device manufacturing method 3 1995
5,926,257 Illumination optical system and exposure apparatus having the same 19 1997
6,515,694 Illumination device and optical processing apparatus using the same 0 2000
6,473,160 Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member 1 2001
6,560,044 Illumination optical system in exposure apparatus 6 2001
6,654,101 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD INCLUDING CHANGING A PHOTO-INTENSITY DISTRIBUTION OF A LIGHT SOURCE AND ADJUSTING AN ILLUMINANCE DISTRIBUTION ON A SUBSTRATE IN ACCORDANCE WITH THE CHANGE 6 2001
 
ASML NETHERLANDS B.V. (3)
6,452,662 Lithography apparatus 62 1999
6,855,486 Lithographic method and apparatus 25 2000
7,061,583 Lithography apparatus 1 2003
 
CARL ZEISS SMT GMBH (2)
6,864,960 Zoom system for an illumination device 3 2002
8,085,382 Microlithographic projection exposure apparatus illumination optics 0 2007
 
ULTRATECH STEPPER, INC. (2)
5,383,000 Partial coherence varier for microlithographic system 28 1992
5,461,456 Spatial uniformity varier for microlithographic illuminator 12 1995
 
ASML HOLDING N.V. (1)
7,876,420 System and method utilizing an electrooptic modulator 0 2004
 
ASML US, LLC (1)
5,724,122 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography 27 1995
 
CARL ZEISS SMT AG (1)
6,784,977 Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography 9 2002
 
HITACHI, LTD. (1)
4,937,619 Projection aligner and exposure method 35 1989
 
HUGLE LITHOGRAPHY (1)
6,016,185 Lens array photolithography 23 1997
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
6,268,908 Micro adjustable illumination aperture 6 1999
 
RENESAS ELECTRONICS CORPORATION (1)
5,382,999 Optical pattern projecting apparatus 13 1993
 
ZEISS, CARL (1)
6,295,122 Illumination system and REMA objective with lens displacement and operating process therefor 14 1999