Illumination optical system

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4851882
SERIAL NO

07267718

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An illumination optical system including an optical system effective to direct light from a light source to a surface to be illuminated, and an optical unit disposed in a path of the light defined by the optical system, the optical unit having a variable refracting power which is variable in accordance with the size of the surface to be illuminated.

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First Claim

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Patent Owner(s)

Patent OwnerAddressTotal Patents
CANON KABUSHIKI KAISHATOKYO44623

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Suzuki, Akiyoshi Tokyo, JP 111 2797
Takahashi, Kazuhiro Kawasaki, JP 248 2039

Cited Art Landscape

Patent Info (Count) # Cites Year
 
NIKON CORPORATION (2)
* 4497015 Light illumination device 140 1983
* 4619508 Illumination optical arrangement 160 1985
 
CANON KABUSHIKI KAISHA (2)
* 4564267 Variable-focal-length lens 117 1982
* 4645924 Observation apparatus with selective light diffusion 35 1983
 
POLAROID CORPORATION (1)
* 4444471 Variable focus lens system employing elastomeric lens 77 1982
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
6268908 Micro adjustable illumination aperture 7 1999
 
NIKON CORPORATION (22)
* 5245384 Illuminating optical apparatus and exposure apparatus having the same 83 1992
* 5296892 Illuminating apparatus and projection exposure apparatus provided with such an illuminating apparatus 30 1993
* 7656504 Projection exposure apparatus with luminous flux distribution 0 1995
* 6252647 Projection exposure apparatus 61 1995
* 5745294 Illuminating optical apparatus 18 1996
* 5760963 Fly-eye lens, illumination optical apparatus, and exposure apparatus 16 1996
RE37352 Projection optical apparatus 0 1996
* 6388733 Exposure apparatus with an anti-vibration structure 16 1999
6636293 Exposure method and apparatus having a decreased light intensity distribution 8 1999
6710854 Projection exposure apparatus 17 2001
6704092 Projection exposure method and apparatus that produces an intensity distribution on a plane substantially conjugate to a projection optical system pupil plane 13 2002
6864959 Projection exposure apparatus 3 2002
6665050 Projection exposure methods using difracted light with increased intensity portions spaced from the optical axis 11 2002
6710855 Projection exposure apparatus and method 55 2002
* 2003/0043,356 Projection exposure apparatus and method 34 2002
* 6985288 Illumination apparatus for microscope and microscope 8 2003
* 2003/0223,108 Illumination apparatus for microscope and microscope 1 2003
6967710 Projection exposure apparatus and method 6 2004
6897942 Projection exposure apparatus and method 4 2004
6885433 Projection exposure apparatus and method 7 2004
* 2004/0233,411 Projection exposure apparatus and method 1 2004
7095560 Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method 16 2004
 
CARL ZEISS SMT AG (1)
* 6784977 Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography 21 2002
 
MICRON TECHNOLOGY, INC. (2)
* 8767179 Imaging methods in scanning photolithography and a scanning photolithography device used in printing an image of a reticle onto a photosensitive substrate 1 2009
* 2011/0141,443 Imaging Methods In Scanning Photolithography And A Scanning Photolithography Device Used In Printing An Image Of A Reticle Onto A Photosensitive Substrate 1 2009
 
Hugle Lithography (1)
* 6016185 Lens array photolithography 27 1997
 
ULTRATECH STEPPER, INC. (2)
* 5383000 Partial coherence varier for microlithographic system 43 1992
* 5461456 Spatial uniformity varier for microlithographic illuminator 16 1995
 
HITACHI, LTD. (1)
* 4937619 Projection aligner and exposure method 38 1989
 
Zeiss, Carl (1)
6295122 Illumination system and REMA objective with lens displacement and operating process therefor 15 1999
 
RENESAS ELECTRONICS CORPORATION (1)
* 5382999 Optical pattern projecting apparatus 55 1993
 
ASML NETHERLANDS B.V. (4)
6452662 Lithography apparatus 101 1999
6855486 Lithographic method and apparatus 34 2000
7061583 Lithography apparatus 31 2003
* 2004/0051,858 Lithography apparatus 0 2003
 
CARL ZEISS SMT GMBH (6)
* 6864960 Zoom system for an illumination device 4 2002
* 2003/0090,638 Zoom system for an illumination device 1 2002
8085382 Microlithographic projection exposure apparatus illumination optics 3 2007
9223226 Microlithographic projection exposure apparatus illumination optics 1 2011
9052611 Microlithographic projection exposure apparatus illumination optics 1 2011
9470981 Microlithographic projection exposure apparatus illumination optics 0 2015
 
ASML US, LLC (1)
* 5724122 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography 42 1995
 
ASML HOLDING N.V. (4)
* 7876420 System and method utilizing an electrooptic modulator 2 2004
* 2006/0121,375 System and method utilizing an electrooptic modulator 4 2004
* 2006/0164,711 System and method utilizing an electrooptic modulator 37 2005
8879045 Method utilizing an electrooptic modulator 0 2010
 
CANON KABUSHIKI KAISHA (15)
* 4988188 Illumination device 97 1988
* 5121160 Exposure method and apparatus 60 1991
* 5424803 Projection exposure apparatus and semiconductor device manufacturing method 18 1994
* 5436692 Projection exposure apparatus and semiconductor device manufacturing method 27 1994
* 5828496 Illumination optical system 5 1994
* 5847746 Projection exposure apparatus including a condenser optical system for imaging a secondary light source at positions different in an optical axis direction with respect to two crossing planes 12 1995
* 5719617 Illumination system for superposing light beams one upon another on a surface using a projecting system having different focal point positions 15 1995
* 6271909 Exposure apparatus and device manufacturing method including changing a photo-intensity distribution of a light source and adjusting an illuminance distribution on a substrate in accordance with the change 8 1995
* 5946024 Illuminating apparatus and device manufacturing method 4 1995
* 5926257 Illumination optical system and exposure apparatus having the same 22 1997
* 6515694 Illumination device and optical processing apparatus using the same 0 2000
6473160 Projection exposure apparatus and device manufacturing method including an aperture member having a circular light transmitting portion and a light blocking member 2 2001
* 6560044 Illumination optical system in exposure apparatus 10 2001
* 6654101 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD INCLUDING CHANGING A PHOTO-INTENSITY DISTRIBUTION OF A LIGHT SOURCE AND ADJUSTING AN ILLUMINANCE DISTRIBUTION ON A SUBSTRATE IN ACCORDANCE WITH THE CHANGE 6 2001
* 2004/0080,736 Imaging method for manufacture of microdevices 3 2003
* Cited By Examiner