Cross-flow diffusion furnace
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United States of America Patent
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Aug 8, 1989
Grant Date -
N/A
app pub date -
Nov 2, 1987
filing date -
Nov 2, 1987
priority date (Note) -
Expired
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Abstract
A longitudinally extending cross-flow liner within a longitudinally extending cylindrical reaction vessel cooperates with at least one longitudinally extending gas injector within the cross-flow liner to provide transversely flowing gas across the surfaces of vertically oriented semiconductor wafers in such a way as to substantially eliminate both depletion phenomenon and downstream wafer pollution caused from particulates, unreacted reactant gas, and other contaminants and to provide uniformly coated wafers in a batch and repeatability batch to batch.
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