Apparatus for detecting position of reference pattern
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United States of America Patent
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-
Aug 22, 1989
Issued Date -
N/A
app pub date -
Jul 6, 1988
filing date -
Apr 19, 1984
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An apparatus for detecting a position of a reference pattern or mark formed in a substrate to be aligned with a photomask pattern performs the following functions: scanning a reference pattern having at least two edges and generating a time-serial pattern signal corresponding to the scanned pattern; extracting all scanning positions at which a waveform of the pattern signal has a shape corresponding to an edge of the pattern within a predetermined scanning range including the pattern; selecting one pair from all possible pairs of a plurality of extracted scanning positions in accordance with a degree to which a pattern signal between the two scanning positions defined by each pair satisfies predetermined waveform conditions; and determining as a pattern position a predetermined position at which the interval between the two scanning positions of the selected pair is divided into two intervals by a predetermined ratio.
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