Carbon deposition by ECR CVD using a catalytic gas

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United States of America Patent

PATENT NO 4871581
SERIAL NO

07216333

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Abstract

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A material consisting mainly of carbon can be formed on a surface by virtue of a microwave energy. A catalyst gas is introduced into a reaction chamber for ECR CVD, along with a carbon compound gas. The catalyst gas consists of a gaseous compound of germanium such as GeH.sub.4 and GeF.sub.4.

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Patent OwnerAddress
SEMICONDUCTOR ENERGY LABORATORY CO LTDJAPAN'S KANAGAWA PREFECTURE ATSUGI CITY ATSUGI-SHI KANAGAWA

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Inventor Name Address # of filed Patents Total Citations
Yamazaki, Shumpei Tokyo, JP 35 380

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