Method of sythesizing carbon film and carbon particles in a vapor phase
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United States of America Patent
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Oct 10, 1989
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N/A
app pub date -
Aug 14, 1985
filing date -
Aug 13, 1982
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Abstract
A vapor phase synthesis of carbon film and carbon particles using a single or a mixed gas capable of supplying halogen, hydrogen and carbon atoms is disclosed. Halogen radicals can suppress the desorption of carbon atoms from the substrate, and the carbon layer is obtained easily. Especially chlorine and fluorine atoms are effective. An electron beam diffraction pattern illustrated that diamond film can be obtained in this method.
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