Plasma pinch system
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United States of America Patent
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-
Dec 26, 1989
Grant Date -
N/A
app pub date -
Dec 7, 1987
filing date -
Dec 7, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plasma pinch system includes a fluid-jet pinch device for establishing a plasma source composed of a tenuous vapor preconditioning cloud surrounding a central narrow flowing fine stream of fluid under pressure. A discharge device is connected electrically to the fluid-jet pinch device for supplying an electrical flow through a portion of the fluid stream for establishing an incoherent light emitting plasma therealong. A method of using the plamsa pinch system for manufacturing semiconductors, includes exposing a semiconductor wafer to the incoherent light emitted by the plasma for either annealing or etching purposes.
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