Method for enhancing chemical reactivity in thermal plasma processes
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United States of America Patent
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Feb 6, 1990
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N/A
app pub date -
Aug 31, 1988
filing date -
Aug 31, 1988
priority date (Note) -
Expired
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Abstract
A method for enhancing a chemical reaction is provided by forming a plasma that includes at least one multiatomic reactant, flowing the plasma into a reaction zone, and then elevating an electron temperature of the plasma by at least about 1,000.degree. Kelvin. The elevated electron temperature increases the dissociation of the multiatomic reactant in the plasma and/or inhibits recombination of the multiatomic reactant when dissociated. The method may be practiced to enhance the chemical vapor deposition of materials such as silicon and diamond.
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