Homogeneous fine grained metal film on substrate and manufacturing method thereof
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United States of America Patent
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May 8, 1990
Issued Date -
N/A
app pub date -
Jan 23, 1989
filing date -
Feb 20, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A homogeneous fine grained metal film (6') on a substrate in accordance with the present invention comprises multiple metal layers and intervening layers (14) between the respective metal layers, the intervening layers being formed of a compound of the metal and a reactive gas and serving to suppress growth of grains (12') in the respective metal layers and to suppress electromigration of grain boundaries (13'). In a method for manufacturing a metal film (6') having homogeneous and fine grains on a substrate in accordance with the present invention, one or more intervening layers (14) are formed by introducing a gas reactive with the metal film one or more times during deposition of the metal film, whereby intervening layers of a metal compound are interposed between the successively deposited metal layers. Thus, a metal film of multilayered structure including multiple metal layers separated by the intervening layers is formed.
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