Plasma etch of masked superconductor film

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 4933318
SERIAL NO

07283417

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Abstract

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A method of manufacturing a thin film of an oxidic superconducting material in accordance with a pattern, in which a pattern is manufactured by means of etching using reactive ions and a mask of aluminium oxide or silicon oxide, said method enabling patterns having line widths smaller than 2 .mu.m to be manufactured with great accuracy without influencing the composition of the superconducting thin film in such a manner that the superconducting properties deteriorate.

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Patent Owner(s)

Patent OwnerAddressTotal Patents
U.S. PHILIPS CORPORATIONNEW YORK, NY978

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Heijman, Maritza G J Eindhoven, NL 5 49

Cited Art Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (1)
* 4560435 Composite back-etch/lift-off stencil for proximity effect minimization 132 1984
 
TEXAS INSTRUMENTS INCORPORATED (2)
* 4657844 Plasma developable negative resist compositions for electron beam, X-ray and optical lithography 8 1985
* 4690729 Tapered trench process 50 1986
 
BELL TELEPHONE LABORATORIES, INCORPORATED (1)
* 4683024 Device fabrication method using spin-on glass resins 41 1985
 
MOTOROLA, INC. (1)
* 4687543 Selective plasma etching during formation of integrated circuitry 33 1986
* Cited By Examiner

Patent Citation Ranking

Forward Cite Landscape

Patent Info (Count) # Cites Year
 
INTERNATIONAL BUSINESS MACHINES CORPORATION (2)
* 5650377 Selective epitaxial growth of high-T.sub.C superconductive material 6 1993
* 6001268 Reactive ion etching of alumina/TiC substrates 9 1997
 
POLARIS INNOVATIONS LIMITED (2)
6454956 Structuring method 9 1998
* 6315913 Structuring method 5 1998
 
SANTA BARBARA RESEARCH CENTER (1)
* 5041188 High temperature superconductor detector fabrication process 2 1990
 
NORTHRUP GRUMMAN SYSTEMS CORPORATION (1)
8852959 Low temperature resistor for superconductor circuits 0 2011
 
VISTEON GLOBAL TECHNOLOGIES, INC. (1)
6331680 Multilayer electrical interconnection device and method of making same 7 1996
 
SAMSUNG ELECTRO-MECHANICS CO., LTD. (1)
* 5219830 Process for preparing high-Tc superconducting integrated circuits 1 1991
 
SUMITOMO ELECTRIC INDUSTRIES, LTD. (1)
* 5840204 Method for patterning a layer on oxide superconductor thin film and superconducting device manufactured thereby 2 1995
 
TRW INC. (1)
* 5286336 Submicron Josephson junction and method for its fabrication 7 1992
 
EASTMAN KODAK COMPANY (1)
* 5552373 Josephson junction device comprising high critical temperature crystalline copper superconductive layers 6 1992
 
VERIZON LABORATORIES INC. (1)
* 5173678 Formed-to-shape superconducting coil 15 1990
 
MITSUBISHI MATERIALS CORPORATION (1)
* 5075200 Process of forming superconductive wiring strip 2 1989
 
AGILENT TECHNOLOGIES, INC. (1)
* 5212147 Method of forming a patterned in-situ high Tc superconductive film 57 1991
 
CANON KABUSHIKI KAISHA (1)
* 5389313 Method of producing a molding die for an information recording medium 11 1992
* Cited By Examiner