Film-forming emulsion polish compositions containing copolymeric siloxanes
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United States of America Patent
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Jun 26, 1990
Grant Date -
N/A
app pub date -
Dec 20, 1988
filing date -
Dec 20, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
Disclosed are emulsion polish compositions comprising a copolymeric siloxane selected from the group consisting of a poly(dimethyl)-co-poly(methylalkyl) siloxane polymer, a poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane polymer, and combinations thereof. The poly(dimethyl)-co-poly(methylalkyl) siloxane copolymer has the formula ##STR1## wherein 'A' is an alkyl radical having 10-20 carbon atoms, and wherein 'w' is 70-91 mole percent and 'x' is 9-30 mole percent. The poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane copolymer has the formula ##STR2## wherein 'B' is (CH.sub.2).sub.i (L)(CH.sub.2 CH.sub.2 O).sub.n R, wherein 'i' is an integer from 3 to 10 inclusive, wherein 'L' is either --O-- or --COO--, wherein 'n' is either zero or an integer from 1 to 3 inclusive, wherein 'R' is --H, --CH.sub.3, or --C.sub.2 H.sub.5, and wherein 'y' is 62-92 mole percent and 'z' is 8-38 mole percent.
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