Method of obtaining relatively aligned patterns on two opposite surfaces of an opaque slice
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United States of America Patent
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Jun 26, 1990
Grant Date -
N/A
app pub date -
Dec 12, 1988
filing date -
Dec 15, 1987
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
The invention relates to a method of obtaining relatively aligned patterns on two opposite surfaces of an opaque slice (2). This can be realized in that the opaque slice (2) carrying a reference pattern (3) is glued on a transparent plate (1) on the side of the said pattern (3) and an alignment pattern (8) aligned with respect to the reference pattern (3) is transferred by photolithography to the plate (1). This alignment pattern (8) is used to form on the other surface of the opaque slice (2) the desired patterns (9) aligned with respect to the alignment pattern (8).
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