Particle beam irradiating apparatus having charge suppressing device which applies a bias voltage between a change suppressing particle beam source and the specimen
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jul 3, 1990
Grant Date -
N/A
app pub date -
Feb 16, 1989
filing date -
Feb 26, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A particle beam irradiating apparatus including a particle beam irradiating device for irradiating a charged particle beam such as ions or electrons to a specimen. A charged particle source is included for irradiating an electron beam to the specimen which is positively charged or an ion beam to the specimen which is negatively charged so as to neutralize the specimen, and a voltage supply is include for applying a bias voltage difference not more than 10 V between the charged particle source and the specimen. As the specimen is not charged with a high voltage, the specimen does not break down. The particle beam irradiating apparatus is effectively used in an electron microscope, an electron beam lithography system, an ion implanter, an ion microprobe analyzer, a secondary ion mass spectrometer.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully