Inspection apparatus and method for detecting flaws on a diffractive surface
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United States of America Patent
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Jul 24, 1990
Grant Date -
N/A
app pub date -
Jun 30, 1989
filing date -
Jun 30, 1989
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An optical inspection system and method for detecting flaws on a diffractive surface such as a reticle or wafer, includes illuminating a surface to be inspected to generate a first scattered energy angular distribution in response to a flaw on the surface and a second scattered energy angular distribution in response to an unflawed surface; the first and second energy distributions are sensed and the minimum energy detection energy level is established; determining whether the minimum detected energy level is in a first or second predetermined energy range and indicating that no flaw is present when the minimum detected energy level is in the first range and a flaw is present when the minimum detected energy level is in the second range.
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