Parylene deposition chamber
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United States of America Patent
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-
Aug 7, 1990
Grant Date -
N/A
app pub date -
Jun 23, 1988
filing date -
Jun 23, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Disclosed is a parylene deposition chamber wherein reactive monomer vapors enter the chamber tangentially so as to create a rotational flow of vapor within the interior of the chamber. A substrate support fixture is positioned within the chamber and rotated in a direction counter to the rotational flow of vapor. An annular space exists between the outer edge of the fixture and the inner wall of the chamber so as to allow the rotating vapor to descend freely within the chamber. Waste of parylene chemicals is minimized by eliminating the need for the positioning of baffles within the chamber.
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