Deposition of diamond films

United States of America Patent

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Aug 14, 1990
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app pub date
Feb 10, 1989
filing date
Feb 10, 1989

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Expired

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Abstract

Diamond films are deposited at substrates below temperatures of 400.degree. C. by chemical vapor deposition using a high powered pulsed laser and a vapor which is an aliphatic carboxylic acid or an aromatic carboxylic anhydride.

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Patent Owner	Address
INTERNATIONAL BUSINESS MACHINES CORPORATION A CORP OF NY	ARMONK NY 10504

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Inventor Name	Address	# of filed Patents	Total Citations
Hacker, Nigel P	Morgan Hill, CA	32	584
Tyndall, III George W	Los Gatos, CA	3	53

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Deposition of diamond films

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07309521

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PATENT NO	4948629
SERIAL NO	07309521
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07309521

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