Processing apparatus and method
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United States of America Patent
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-
Aug 21, 1990
Issued Date -
N/A
app pub date -
Dec 21, 1985
filing date -
Oct 24, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A processing apparatus and method wherein two separate gas feeds are provided in proximity to the face of a face down wafer. A shroud can be used to maximize mixing of the two gas feed streams without excessive residence time.
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