Pattern selecting device capable of selecting favorable candidate patterns
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United States of America Patent
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Sep 11, 1990
Grant Date -
N/A
app pub date -
Nov 28, 1989
filing date -
Nov 29, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
In a pattern selecting device for use in combination with a pattern collating device for collating an input pattern with a plurality of registered patterns to produce first through N-th candidate pattern signals indicative of first through N-th candidate patterns which have first through N-th candidate degrees of similarity relative to the input pattern, where N represents an integer which is not less than two and is not greater than the number of the registered patterns, a processing unit processes (n+1)-th through the N-th candidate pattern signals and produces an approximation signal representative of an approximation variable related to (n+1)-th through the N-th candidate degrees, where n is variable from 1 toward N. An estimating unit estimates an n-th estimated degree for an n-th candidate pattern with reference to the approximation variable to produce an estimated signal representative of the n-th estimated degree. A deciding unit decides whether or not a ratio of the n-th estimated degree to the n-th candidate degree is not smaller than a predetermined value and produces an output numeral representative of n-th candidate pattern when the ratio is not smaller than the predetermined value. Instead of the ratio, it is possible to use a weighted mean value of the n-th candidate degree and the ratio of the n-th estimated degree to the n-th candidate degree.
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Patent Owner(s)
| Patent Owner | Address | |
|---|---|---|
| NEC CORPORATION | 7-1 SHIBA 5-CHOME MINATO-KU TOKYO 108-8001 |
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Inventor(s)
| Inventor Name | Address | # of filed Patents | Total Citations |
|---|---|---|---|
| Hara, Masanori | Tokyo, JP | 86 | 996 |
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