US Patent No: 4,958,591
Number of patents in Portfolio can not be more than 2000
Apparatus for forming a functional deposited film by means of plasma chemical vapor deposition
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Sep 25, 1990
Issued date -
Mar 13, 1989
filing date -
07/323,202
serial no -
Expired
status
Importance
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Abstract
Improvements in the apparatus for forming a functional deposited film by means of plasma chemical vapor deposition comprising a deposition chamber having a film forming space which is sealed and formed by a surrounding wall functioning as a cathode, an upper wall and a bottom wall, which contains a means for holding a cylindrical substrate functioning as an anode in the film forming space and which is provided with a film forming raw material gas supplying means, a means for impressing a discharging power between said cathode and said anode and a vacumming means, that the length L of said cathode and the interval d between the inside face of said cathode and the surface of said anode is so designed as to satisfy the equation: 5.ltoreq.L/d.ltoreq.40. According to this improved apparatus, a desired light receiving memer, even if it is of a large square, which is excellent in both homogeneity in the layer quality and uniformity in layer thickness can be stably and effectively prepared at a high deposition speed.
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First Claim
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International Classification(s)
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Cited Art
| Patent Info | (Count) | # Cites | Year |
|---|---|---|---|
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| 4,529,474 Method of cleaning apparatus for forming deposited film | 67 | 1984 | |
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| 4,615,299 Plasma CVD apparatus for making photoreceptor drum | 7 | 1985 | |
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| 4,501,766 Film depositing apparatus and a film depositing method | 30 | 1983 | |
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| 4,466,380 Plasma deposition apparatus for photoconductive drums | 28 | 1983 | |