Resistance heater for diamond production by CVD
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United States of America Patent
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Sep 25, 1990
Grant Date -
N/A
app pub date -
Aug 22, 1988
filing date -
Aug 22, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A plural substrate CVD apparatus for diamond crystal production utilizes spaced apart vertical, parallel, planar substrate panels with an electrical (direct current, D.C.) resistance filament heater therebetween. A hydrogen-hydrocarbon gas mixture flows between panels to come into contact with the heater and the panels to cause diamond crystal nucleation and growth on the substrate panels. The apparatus includes means for maintaining the spaced relationship of the heater from the substrate surfaces, comprising a rod member attached to one end of the heater and tensioned by a cable passing over a pulley member and attached to a weight.
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