Process for fabrication of high resolution flat panel plasma displays
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United States of America Patent
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-
Oct 16, 1990
Issued Date -
N/A
app pub date -
Jul 10, 1989
filing date -
Nov 25, 1987
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of fabricating a display panel on a substrate material of soda-lime float glass. A dielectric layer composed of a mixture of lead, silicon and aluminum is deposited on the substrate to a thickness of from 25 to 150 microns. A masking pattern is defined on the surface of the dielectric layer where plasma display cavities are to be formed. Openings are etched in the dielectric layer with fluoboric acid to geometries no larger than approximately 0.15 mm wide by 0.15 mm thick at regions defined by the masking pattern, the openings extending to the major surface of the substrate and forming a plasma display cavity. A cover is provided over the cavity to form an enclosed envelope containing a noble gas. A phosphor is provided in the plasma display cavity together with electrodes adjacent to the cavity for ionizing the gas and exciting the phosphor.
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