Diffuser features for spin-coated films
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United States of America Patent
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-
Nov 20, 1990
Grant Date -
N/A
app pub date -
Feb 12, 1990
filing date -
Feb 12, 1990
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
In forming integrated circuits on a wafer, diffuser features are provided adjacent to topographic features so that when a film is formed by spin-coating a liquid precursor over the integrated circuits, the action of the spreading liquid relative to the diffuser features in proximity to topographic features minimizes radial streaks which would have been caused by the topographic features.
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