Method of cleaning wafers or the like

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United States of America Patent

PATENT NO 4972677
SERIAL NO

07308856

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Abstract

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Liquid carbon dioxide substantially free of particles is prepared by evaporating liquid carbon dioxide, passing the resulting gaseous carbon dioxide through a suitable filter to remove particles therefrom and cooling the particle-free gas to reliquefy it.

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Patent Owner(s)

Patent OwnerAddress
OSAKA SANSO KOGYO LTD A CORP OF JAPAN1-14 MIYAHARA 4-CHOME YODOGAWA-KU OSAKA 532

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Moriya, Kozo Ibaragi, JP 2 122
Ookatsu, Tadashi Kobe, JP 1 14

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