Method of applying optical coatings of silicon compounds by cathode sputtering, and a sputtering cathode for the practice of the method
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United States of America Patent
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Dec 18, 1990
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N/A
app pub date -
Jan 27, 1987
filing date -
May 12, 1984
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Expired
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Abstract
Method of applying optical coatings of silicon compounds to substrates by reactive cathode sputtering of siliceous target materials. To solve the problem of improving the utilization of the target material and eliminating the blowout of particles from the target, the target of the invention is a polycrystalline silicon casting of at least 99% silicon containing dopants from the group, boron, antimony, phosphorus and arseic, and it is sputtered by direct current in an atomsphere containing the reaction gas.
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