Photoresist stripping compositions
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United States of America Patent
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Feb 12, 1991
Grant Date -
N/A
app pub date -
Jan 18, 1990
filing date -
Jan 18, 1990
priority date (Note) -
Expired
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Abstract
A non-aqueous biodegradable negative photoresist stripping composition having low toxicity and is operable at temperatures at 85.degree. C. or less which comprises about 85% by weight of an aromatic hydrocarbon solvent of the formula selected from the group consisting of: ##STR1## wherein R.sub.1 and R.sub.2 are the same or different and each is a member selected from the group consisting of methyl, ethyl n-propyl and isopropyl, and an organic sulfonic acid of the formula: R.sub.3 --SO.sub.3 H wherein R.sub.3 is a member selected from the group consisting of phenyl, tolyl, dodecylbenzene and naphthyl, the ratio of the aromatic solvent to organic solvent acid being about 60 to 96% by weight to about 4 to 40% by weight.
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