Dual ion beam ballistic alloying process
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United States of America Patent
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Feb 12, 1991
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N/A
app pub date -
Oct 11, 1988
filing date -
Oct 11, 1988
priority date (Note) -
Expired
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Abstract
The invention discloses a dual ion beam ballistic alloying process for forming a film such as diamond onto a substrate, which comprises the steps of: (a) cleaning the surface of the substrate with a first energy beam of inert atoms; (b) depositing a layer of a desired non-hydrocarbon substance on the substrate with a low energy, sputtered atomic beam; (c) simultaneously exposing the substrate to said first energy beam of inert atoms with a high energy to grow a ballistically alloyed layer having a thickness of about 10-2000 .ANG.; and (d) reducing the energy level of the first, high energy beam to cause the growth of the layer of said substance on said substrate to a final desired thickness.
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