A method of and apparatus for comparing the location of an extended feature within a field of view with a standard location
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United States of America Patent
Stats
-
Feb 26, 1991
Grant Date -
N/A
app pub date -
Dec 1, 1989
filing date -
Dec 1, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
Method of, and apparatus for, comparing the location of an extended feature within a field of view with a standard location. The field of view is scanned to obtain a binary video signal representing the feature, the signal is processed to give a single feature position pulse when scanning of the feature has been completed, the scan co-ordinates of the feature position pulse are determined, and the co-ordinates are compared with those corresponding to the standard location. The area of the feature may also be determined. The method is applicable to the checking of printed circuit boards.
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Cited Art Landscape
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