Aluminum contact etch mask and etchstop for tungsten etchback

United States of America Patent

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Mar 5, 1991
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N/A
app pub date
Oct 31, 1988
filing date
Oct 31, 1988

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Expired

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Abstract

A method for forming CVD tungsten contacts in a planarized semiconductor body. The method utilizes aluminum as an etch mask and etch stop to prevent etching of underlying layers during contact formation.

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Patent Owner	Address
TEXAS INSTRUMENTS INCORPORATED A CORP OF DE	13500 NORTH CENTRAL EXPRESSWAY DALLAS TX 75265

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Adams, Martha S	Rosenberg, TX	2	65
Harper, Ralph G	Guy, TX	2	65
Keller, Stephen A	Sugar Land, TX	15	390
Spry, Piper A	Sugar Land, TX	2	65

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Aluminum contact etch mask and etchstop for tungsten etchback

Number of patents in Portfolio can not be more than 2000

United States of America Patent

07265162

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PATENT NO	4997789
SERIAL NO	07265162
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07265162

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