Method of controlling the chemical structure of polymeric films by plasma
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United States of America Patent
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Mar 26, 1991
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N/A
app pub date -
Aug 31, 1989
filing date -
Aug 31, 1989
priority date (Note) -
Expired
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Abstract
A method of controlling the chemical structure of thin films formed by plasma deposition and films produced by these methods, is disclosed. An important aspect of the method involves controlling the temperature of the substrate and the reactor so as to create a temperature differential between the substrate and reactor such that the precursor molecules are preferentially adsorbed or condensed onto the substrate either during plasma deposition or between plasma deposition steps. The thin films produced by the methods of this invention exhibit more defined and predictable chemical structures and properties than conventional plasma deposited films.
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