Semiconductor diffusion furnace inner tube
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United States of America Patent
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-
Jun 18, 1991
Grant Date -
N/A
app pub date -
Aug 15, 1989
filing date -
Aug 15, 1988
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
An inner tube for use in a semiconductor diffusion furnace is provided comprising a liner or diffusion tube and an insulating layer formed on the entire outer surface of the tube by spraying, typically plasma spraying. The sprayed insulating layer is resistant to deterioration and peeling, ensuring an extended period of service for the tube.
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