Deep ultraviolet (UV) lens for use in a photolighography system
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United States of America Patent
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-
Jul 16, 1991
Grant Date -
N/A
app pub date -
Dec 27, 1989
filing date -
Dec 27, 1989
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A deep ultraviolet (UV) lens for use in a photolithography system provides enhanced resolution by using shorter wavelengths of light exposure (in the ultraviolet wavelength). The improved lens includes a meniscus and a first mirror for imaging light in the deep ultraviolet range to the meniscus. The meniscus images the light to a plano-convex lens which is located proximately to the concave surface of the meniscus. The lens further includes a pair of optical elements (prisms) proximately located to the plano surface of the plano-convex lens. The present invention provides for operation in the deep ultraviolet range with a aperture in one embodiment of 0.350.
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